Open
4” Mask Aligner to the ICS Clean Room Queens Building
Descriptions
The required equipment is a mask aligner (alignment of a substrate or wafer to a patterned mask for UV photolithography) able to use variable sized masks and substrates for top side alignment. It should have the option, priced separately, of DUV exposure for PMMA resist.NOTE: To register your interest in this notice and obtain any additional information please visit the Sell2Wales Web Site at https://www.sell2wales.gov.wales/Search/Search_Switch.aspx?ID=86819.
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CPV Codes
38636100 - Lasers
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Possible Competitors
1 Possible Competitors