Dry Based Chemical Absorption III-V Gas Abatement System (x two)

Descriptions

The EPSRC National Epitaxy Facility (NEF) at the University of Sheffield supplies a wide range of III-V semiconductor materials primarily to the UK academic research community by the means of the MOVPE (MOCVD) process. The NEF also engages in significant activity researching and developing new materials and structures. The NEF requires two new dry-chemical absorption-based gas abatement systems for scrubbing process gases carried by hydrogen to the abatement system by a system pump. The system must be able to remove all hazardous materials efficiently and safely from the process tool ensuring the safety of personnel and in compliance with regulatory emission standards at the output of the abatement system.