Dual growth chamber Molecular Beam Epitaxy System

Descriptions

This is a PIN notice for a procurement exercise, which is likely to be published by the University of Sheffield in early 2025: The EPSRC National Epitaxy Facility (NEF) based at the University of Sheffield has been providing bespoke semiconductor wafers to academia and industry for 45 years. It is a unique world-class centre combining technical excellence and expertise with state-of-the-art epitaxy and material characterization equipment. We are looking to further enhance our capability provision to the UK semiconductor community, by investing in a new linked dual-chamber Molecular Beam Epitaxy (MBE) System for arsenides/phosphides and arsenides/antimonides growth that is fully automated, capable of 24/7 operation, reliable, and resource-efficient allowing further expansion in the future. NEF currently supplies epitaxy wafers to over 200 users across 28 UK Universities and industry to support UKRI grants worth over £150M. Our performance is governed by Key Performance Indicators agreed with the EPSRC and include reactor downtime. Therefore, reliability of the system is a key factor, and exemplary after sales service, equipment monitoring tools, and back-up systems are essential.