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Inorganic Chemical Vapour Deposition
Descriptions
The University of Manchester (GEIC) plans the purchase of a Chemical Vapour Deposition (CVD)/Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the deposition of inorganic 2D and related materials. Initially these materials will include Nitrides, Hydrides, Sulphides and Selenides of Boron, Molybdenum, Tungsten, Niobium and Bismuth with the ability to add further variants at a later date. The system will deposit onto (up to) 4 inch diameter wafers. It will also include an integrated Glovebox for wafer handling and loading.The system must be able to be run manually and automatically from recipes with integrated data and event logging. It must be of a fail-safe design with integrated interlocking and must comply with the relevant safety regulations and protocols (e.g. PUWER).
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Tender Regions
CPV Codes
38000000 - Laboratory, optical and precision equipments (excl. glasses)
24315000 - Miscellaneous inorganic chemicals
42900000 - Miscellaneous general and special-purpose machinery
42000000 - Industrial machinery
42993000 - Chemical industry machinery
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Possible Competitors
1 Possible Competitors
