Awarded

Plasma Atomic Layer Deposition Machine

Descriptions

A plasma ALD system is required for the deposition of metal oxides, nitrides and metals onto semiconductor substrates, primarily onto III-V compound semiconductors, under vacuum conditions using specialist gases, liquids and solids.

Timeline

Published Date :

6th Oct 2017 7 years ago

Deadline :

N/A

Tender Awarded :

1 Supplier

Awarded date :

3rd Oct 2017

Contract Start :

N/A

Contract End :

N/A

Tender Regions

Wales

CPV Codes

38000000 - Laboratory, optical and precision equipments (excl. glasses)

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Workflows

Status :

Awarded

Assign to :

Tender Progress :

Details

Notice Type :

Open opportunity

Tender Identifier :

IT-378-246-T: 2024 - 001

TenderBase ID :

310724019

Low Value :

£100K

High Value :

£1000K

Region :

North Region

Attachments :

020044-2024.pdf

Buyer Information

Name :

The City of Liverpool College

Address :

Liverpool Merseyside , Merseyside , L13 0BQ

Website :

N/A

Procurement Contact

Name :

Tina Smith

Designation :

Chief Executive Officer

Phone :

0151 252 3243

Email :

tina.smith@shared-ed.ac.uk

Possible Competitors

1 Possible Competitors