UCAM 022/16 Provision of a laser writer lithography system.

Descriptions

The University of Cambridge, Department of Engineering is a leading research institution equipped with state of the art facilities for investigation of novel materials and development of electronic devices with improved performances and new functionalities. The Department includes extensive clean facilities used for micro and nano fabrication of electronic devices. A fundamental step in the fabrication of any devices is the patterning of suitable polymers (called resist) through photo-lithography or electron beam lithography. The polymer mask is then used to transfer the lithographically-defined pattern to a sample, e.g. to deposit metal contacts or selective etching. The Department is equipped both with electron beam lithography and mask aligner, but lacks of a laser lithography system, which would complete the lithography capabilities required for research. The lithography suite will be located in the class 100 clean room of the Cambridge Graphene Centre (CGC). Due to its flexibility of use and hence the large number of potential users, it is expected that the laser writer will be used for a minimum of 8 hours a day, 7 days a week. It is also expected that the machine could run unattended overnight.