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The College of Engineering at Swansea University requires an atomic layer deposition (ALD) instrument which will be capable of depositing ultra-thin (typically 0.5-10 nm) layers of various metal oxides and metals on flat and porous glass, plastic, an ....

The Department of Physics and Astronomy at The University of Sheffield, requires an atomic layer deposition (ALD) system for the growth of ultra-thin layers of metal oxides on substrates for use in a range of optoelectronic devices. The system needs ....

The University has issued this Invitation to Tender (ITT) for the provision of an Atomic Layer Deposition (ALD) system in accordance with the ITT and associated documentation.

The aim of the project is to establish scalable solution processing of active materials in inorganic thin-film solar cells. The work programme tackles the processing of Cu2ZnSn(S,Se)4 and CuIn(S,Se)2 absorbers as well as buffer layers requires for ch ....

The Quantum Engineering Technology Labs (QETLabs) at the University of Bristol is a global centre for excellence in quantum optics. QETLabs have invested heavily in the University of Bristol Cleanroom Facility to enable fabrication and characterizati ....

A plasma ALD system is required for the deposition of metal oxides, nitrides and metals onto semiconductor substrates, primarily onto III-V compound semiconductors, under vacuum conditions using specialist gases, liquids and solids.

A plasma ALD system is required for the deposition of metal oxides, nitrides and metals onto semiconductor substrates, primarily onto III-V compound semiconductors, under vacuum conditions using specialist gases, liquids and solids.

The University of Warwick, School of Engineering Department, has a requirement for Atomic Layer Deposition System for deposition of thin films on a range of substrates.

The University of Warwick, School of Engineering Department, has a requirement for Atomic Layer Deposition System for deposition of thin films on a range of substrates. The system will have plasma-enhanced and thermal deposition capabilities, and wil ....

The College of Engineering at Swansea University requires an atomic layer deposition (ALD) instrument which will be capable of depositing ultra-thin (typically 0.5-10 nm) layers of various metal oxides and metals on flat and porous glass, plastic, an ....