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UCL would like to invite suppliers to submit bids for supply a for Automatic Layer Deposition of Metal Oxides, Metals and Nitrides on different substrates. The value for this tender is estimated at 500 000 GBP. For the full technical specification an ....

The University Of Manchester (GEIC) has purchased a Chemical vapour deposition (CVD) / Plasma enhanced chemical vapour deposition (PECVD) system for the deposition of inorganic 2D and related materials. Initially these materials will include Nitrides ....

A plasma ALD system is required for the deposition of metal oxides, nitrides and metals onto semiconductor substrates, primarily onto III-V compound semiconductors, under vacuum conditions using specialist gases, liquids and solids.

A plasma ALD system is required for the deposition of metal oxides, nitrides and metals onto semiconductor substrates, primarily onto III-V compound semiconductors, under vacuum conditions using specialist gases, liquids and solids.

As part of a major research activity on novel low energy electronics we wish to sputter deposit thin film hetero-structures on substrates up to 4" in diameter with precise layer thickness control and high run to run reproducibility. We require the ca ....

UCL would like to invite suppliers to submit bids for supply of services for Automatic Layer Deposition of Metal Oxides, Metals and Nitrides on different substrates. The value for this tender is estimated at GBP 500 K. For the full technical specific ....

We are looking for a suite of thermophysics systems (laser flash analyser, simultaneous thermal analysis, dilatometer) for our new fuel fabrication and analysis facility. Current target materials are uranium and thorium based oxides, silicides, nitri ....

The Sir Henry Royce Institute (SHRI) has been established to develop and exploit the UK's world-leading excellence in advanced materials research. As part of nine material themes, the SHRI Hub Building, situated on the University of Manchester's main ....

The University of Manchester (GEIC) plans the purchase of a Chemical Vapour Deposition (CVD)/Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the deposition of inorganic 2D and related materials. Initially these materials will include Ni ....

A plasma ALD system is required for the deposition of metal oxides, nitrides and metals onto semiconductor substrates, primarily onto III-V compound semiconductors, under vacuum conditions using specialist gases, liquids and solids.