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A plasma ALD system is required for the deposition of metal oxides, nitrides and metals onto semiconductor substrates, primarily onto III-V compound semiconductors, under vacuum conditions using specialist gases, liquids and solids.

A plasma ALD system is required for the deposition of metal oxides, nitrides and metals onto semiconductor substrates, primarily onto III-V compound semiconductors, under vacuum conditions using specialist gases, liquids and solids.

As part of a major research activity on novel low energy electronics we wish to sputter deposit thin film hetero-structures on substrates up to 4" in diameter with precise layer thickness control and high run to run reproducibility. We require the ca ....

We are looking for a suite of thermophysics systems (laser flash analyser, simultaneous thermal analysis, dilatometer) for our new fuel fabrication and analysis facility. Current target materials are uranium and thorium based oxides, silicides, nitri ....

The Sir Henry Royce Institute (SHRI) has been established to develop and exploit the UK's world-leading excellence in advanced materials research. As part of nine material themes, the SHRI Hub Building, situated on the University of Manchester's main ....

A plasma ALD system is required for the deposition of metal oxides, nitrides and metals onto semiconductor substrates, primarily onto III-V compound semiconductors, under vacuum conditions using specialist gases, liquids and solids.

The University of Leeds is seeking tenders for an ex situ (standalone) spectroscopic ellipsometer. The system will be used for research and should offer flexibility of use, having the ability to measure the properties of thin-films (including isotrop ....

As part of a major research activity on novel low energy electronics we wish to sputter deposit thin film heterostructures on substrates up to 4" in diameter with precise layer thickness control and high run to run reproducibility. We require the cap ....